• Phone: (408) 526 2333

Thermal Oxides & Annealing

Hionix offers in house dry and wet oxidation services for 2" - 18" diameter wafers.

Hionix has a library of recipes for thermal oxide processes and has implemented hardware modifications to deliver the highest quality films with extremely low contaminants and minimal particle counts.

Wet Oxidation :
2k A - 20 k with wafer within wafer non uniformity of ± 5% range and target thickness tolerance of ± 10%

Dry Oxidation :
500A - 3k with wafer within wafer uniformity of ± 10% range and target thickness tolerance of ± 10%.

Hionix also offers annealing services at atmosphere/in inert environment.